Fr. Mcfeely et al., AN INQUIRY CONCERNING THE PRINCIPLES OF SI 2P CORE-LEVEL PHOTOEMISSION SHIFT ASSIGNMENTS AT THE SI SIO2 INTERFACE/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2824-2831
It has long been held that high resolution x-ray photoemission spectra
of the Si 2p core level at SiSiO2 interfaces provide important struct
ural information, and that any credible interfacial model must be able
to account for these data. To this end it has traditionally been assu
med that there existed a one-to-one relationship between chemically sh
ifted spectral features and interfacial silicon atoms in specific form
al oxidation states. A series of new measurements of Si 2p core level
binding energies for cluster-derived Si/Si oxide interfaces appear to
stand in direct contradiction to this critical assumption. In this art
icle we present a critique of various responses to the challenge posed
by the new observations. Particular attention is given to the logical
consequences of either maintaining or rejecting the one-to-one relati
onship between shifted features and formal silicon oxidation states an
d to the challenges each of these responses must meet if they are to p
revail. (C) 1996 American Vacuum Society.