Yl. Chang et al., INTERACTION OF HYDROGEN-IONS WITH OXIDIZED GAAS(100) AND ALAS(100) SURFACES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2914-2917
We have performed photoemission experiments, using a tunable soft x-ra
y synchrotron radiation source to study the chemical changes of oxidiz
ed GaAs and AlAs surfaces subject to exposure from hydrogen ions. Resu
lts indicate that the net effects for hydrogen ion irradiation are (i)
the reduction of arsenic and (ii) the growth Of the cation oxide comp
onents. The reduction of arsenic can result from the formation/desorpt
ion of arsine. The oxide overlayer after hydrogen ion treatments is do
minated by cation oxides which are the more stable chemical species as
described in the phase diagram. This oxide layer should then remain s
table in atmosphere. These results can provide insight into the chemic
al reaction between hydrogen ions and oxidized AlGaAs surfaces. (C) 19
96 American Vacuum Society.