Fn. Chukhovskii et al., ANISOTROPIC ELASTICITY CORRECTIONS FOR REFLECTION EFFICIENCY AND X-RAY STANDING-WAVE PATTERNS USING BENT CRYSTALS, Journal of applied crystallography, 29, 1996, pp. 438-445
Anisotropic elasticity corrections are taken into account to evaluate
the reflection efficiency I-int and the X-ray standing-wave patterns (
XSWP) P(Delta theta, Phi) for bent crystals, where Delta theta is the
angular coordinate associated with the conventional rocking curve and
the phase Phi=hr(P) is related to the position with respect to the cry
stalline lattice of the adsorbed atoms on the crystal surface, contrib
uting to the XSWP. Analytical expressions are derived for the uniform
strain-gradient parameter B = 1/4 (partial derivative(2)/ partial deri
vative(so) partial derivative(sh)) [hu(r)] governing the peculiarities
of the Bragg diffraction within elastically bent crystals, where h is
the reflecting vector, u(r) is the displacement vector and so and s(h
) are the dimensionless coordinates along the incident and diffracted
waves, respectively. The cases of the so-called free and forced bendin
g in the Johann and von Hamos geometries are considered. The results o
f the anisotropic elasticity corrections depending on the crystal-surf
ace orientation are presented for bent silicon (111) and quartz (10.0)
and(10.(1) over bar) orientations.