Lm. Sparing et al., PHOTOLUMINESCENCE BLUESHIFT INDUCED BY REACTIVE ION ETCHING OF STRAINED CDZNSE ZNSE QUANTUM-WELL STRUCTURES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3654-3657
A study of the effects of reactive ion etching (RIE) on molecular beam
epitaxy-grown Zn1-xCdxSe/ZnSe strained multiple quantum well samples
using low temperature photoluminescence reveals a blueshift in the cha
racteristic peak positions of the wells when etched with CH4/H-2. Base
d on the experimental results, we suggest that the blueshift is not a
result of hydrogen incorporation, but that etch induced damage relaxes
the compressive strain present in the as-grown quantum well, producin
g the observed blueshift. After thermal annealing the energy of the ph
otoluminescence signal returns to its original value, suggesting a res
toration of the strain by elimination of the structural damage induced
by RIE. However, the original photoluminescence intensity is not reco
vered by annealing. (C) 1996 American Vacuum Society.