PHOTOLUMINESCENCE BLUESHIFT INDUCED BY REACTIVE ION ETCHING OF STRAINED CDZNSE ZNSE QUANTUM-WELL STRUCTURES/

Citation
Lm. Sparing et al., PHOTOLUMINESCENCE BLUESHIFT INDUCED BY REACTIVE ION ETCHING OF STRAINED CDZNSE ZNSE QUANTUM-WELL STRUCTURES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3654-3657
Citations number
12
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
14
Issue
6
Year of publication
1996
Pages
3654 - 3657
Database
ISI
SICI code
1071-1023(1996)14:6<3654:PBIBRI>2.0.ZU;2-M
Abstract
A study of the effects of reactive ion etching (RIE) on molecular beam epitaxy-grown Zn1-xCdxSe/ZnSe strained multiple quantum well samples using low temperature photoluminescence reveals a blueshift in the cha racteristic peak positions of the wells when etched with CH4/H-2. Base d on the experimental results, we suggest that the blueshift is not a result of hydrogen incorporation, but that etch induced damage relaxes the compressive strain present in the as-grown quantum well, producin g the observed blueshift. After thermal annealing the energy of the ph otoluminescence signal returns to its original value, suggesting a res toration of the strain by elimination of the structural damage induced by RIE. However, the original photoluminescence intensity is not reco vered by annealing. (C) 1996 American Vacuum Society.