PRECISION OPTICAL ASPHERES FOR EXTREME-ULTRAVIOLET LITHOGRAPHY

Authors
KANIA DR GAINES DP SWEENEY DS SOMMARGREN GE LAFONTAINE B VERNON SP TICHENOR DA BJORKHOLM JE ZERNIKE F KESTNER RN
Citation
Dr. Kania et al., PRECISION OPTICAL ASPHERES FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3706-3708
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
14
Issue
6
Year of publication
1996
Pages
3706 - 3708
Database
ISI
SICI code
1071-1023(1996)14:6<3706:POAFEL>2.0.ZU;2-W
Abstract
We have demonstrated significant advances in the production of aspheri c optics for extreme ultraviolet lithography. An optic has been fabric ated with an aspheric departure of 1.5 mu m, a figure error of 0.7 nm rms, and a nanoroughness of 0.25 nm rms. Further improvements are requ ired in the figure and nanoroughness to reach high throughput and near diffraction limited performance in an extreme ultraviolet lithography system. (C) 1996 American Vacuum Society.