STUDIES ON CORRECTION ACCURACY OF PROXIMITY EFFECT FOR THE PATTERN AREA DENSITY METHOD IN ELECTRON-BEAM DIRECT WRITING

This article describes the correction accuracy of the pattern area den sity method for 0.2 mu m rule patterning, carrying out simulation and experiments. To enhance the mu m correction accuracy at the boundary z one of the different pattern densities, a novel technique using the gr adient vectors of the pattern density is proposed and its capability f or sub-0.15-mu m pattern fabrication is demonstrated. (C) 1996 America n Vacuum Society.