A. Grenville et al., CALORIMETRIC MEASUREMENTS OF OPTICAL-MATERIALS FOR 193 NM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4184-4187
We have developed a new calorimetric method to accurately determine th
e absorption coefficient at 193 nm of optical materials such as fused
silica and calcium fluoride. The amount of absorbed radiation is the p
ower consumed by a thermoelectric cooler that maintains the sample at
room temperature during exposure with a 193 nm laser. We report initia
l results from five types of fused silica which indicate that absorpti
on coefficients are still a factor of 3 higher than the target of 0.00
1 cm(-1) and that batch to batch variations remain common. The absorpt
ion coefficient for one grade of calcium fluoride has also been obtain
ed. On one fused silica sample, an upper bound has been placed on the
two-photon absorption coefficient at a factor of 2 lower than those pr
eviously reported. Measurements have been performed under a variety of
vacuum conditions yielding anomalous losses in transmission. (C) 1996
American Vacuum Society.