GAINP INGAAS/GAAS GRADED BARRIER MODFET GROWN BY OMVPE - DESIGN, FABRICATION, AND DEVICE RESULTS/

Citation
B. Pereiaslavets et al., GAINP INGAAS/GAAS GRADED BARRIER MODFET GROWN BY OMVPE - DESIGN, FABRICATION, AND DEVICE RESULTS/, I.E.E.E. transactions on electron devices, 43(10), 1996, pp. 1659-1664
Citations number
14
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
43
Issue
10
Year of publication
1996
Pages
1659 - 1664
Database
ISI
SICI code
0018-9383(1996)43:10<1659:GIGBMG>2.0.ZU;2-L
Abstract
GaxIn1-xP/GayIn1-yAs/GaAs Modulation Doped Field Effect Transistors (M ODFET's) with a pseudomorphic barrier and a pseudomorphic channel were grown by Organo Metallic Vapor Phase Epitaxy (OMVPE). This material s ystem is promising for advanced MODFET's on GaAs for high frequency an d power applications, because of the large discontinuity in the conduc tion band, advantages in the processing and the capability to increase the energy separation between the bottom of the conduction band and F ermi level by compositionally grading the barriers. Record 2-Dimension al Electron Gas (2-DEG) carrier densities of 3.1 . 10(12) cm(-2) for s ingle-sided MODFET's were measured. Measured RF power at 10 GHz for 0. 25 mu m devices was greater than or equal to 0.4 W/mm. For the first t ime cutoff frequencies f(T) and f(max) exceeding 105 and 188 GHz, resp ectively, were obtained for this material system with 0.1 mu m gate-le ngth MODFET's.