SLOW LASER DEPOSITION OF HIGH-QUALITY ERBA2CU3O7-X THIN-FILMS

High quality ErBa2Cu3O7-x thin films were grown by reactive laser depo sition on yttria-stabilized zirconia substrate. The structural and ele ctrical properties of the samples were investigated by x-ray double-cr ystal diffractometry, texture analysis and reciprocal space mapping, a nd resistivity measurements, respectively. The best films were obtaine d by using high substrate temperature combined with a low fluence and low laser repetition rate. In these conditions the deposition rate res ults were very low, namely <0.25 Angstrom/s. We found that in this cas e we can grow films with a very high degree of crystalline perfection. Preliminary results show that this process promotes the fabrication o f very thick films (thickness >500 nm) which are highly c-axis oriente d. (C) 1996 American Vacuum Society.