COMPARISON OF THE CRYSTALLINE QUALITY OF STEP-GRADED AND CONTINUOUSLYGRADED INGAAS BUFFER LAYERS

Citation
P. Kidd et al., COMPARISON OF THE CRYSTALLINE QUALITY OF STEP-GRADED AND CONTINUOUSLYGRADED INGAAS BUFFER LAYERS, Journal of crystal growth, 169(4), 1996, pp. 649-659
Citations number
23
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
169
Issue
4
Year of publication
1996
Pages
649 - 659
Database
ISI
SICI code
0022-0248(1996)169:4<649:COTCQO>2.0.ZU;2-7
Abstract
In this paper we summarize work carried out to investigate the relaxat ion of epitaxial strained layers of InGaAs on GaAs, where the InGaAs c omposition has been increased throughout the layer in either a stepwis e or linearly graded form. The results are presented from the viewpoin t of exploiting the relaxed layers to provide prescribed in-plane surf ace lattice parameters for subsequent use as ''virtual'' substrates fo r novel devices. We compare the behaviour of step-graded and linearly graded InGaAs layers, We consider the crystalline quality of different structures and discuss the design requirements for subsequent device quality growth.