ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN

Authors
CHANG THP THOMSON MGR YU ML KRATSCHMER E KIM HS LEE KY RISHTON SA ZOLGHARNAIN S
Citation
Thp. Chang et al., ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN, Microelectronic engineering, 32(1-4), 1996, pp. 113-130
Citations number
32
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
32
Issue
1-4
Year of publication
1996
Pages
113 - 130
Database
ISI
SICI code
0167-9317(1996)32:1-4<113:ET-STM>2.0.ZU;2-B
Abstract
As a continued effort to improve the performance of low energy scannin g electron probe systems for application in microscopy, lithography, m etrology, etc., miniaturized electron beam columns, approximately 3 mm in length, demonstrating a probe size of 10 nm with a beam current of greater than or equal to 1 nA at 1 keV, have been successfully develo ped. This paper presents current status, future directions and potenti al applications of these microcolumns.