FABRICATION AND UNIFORMITY ISSUES IN LAMBDA 4 SHIFTED DFB LASER ARRAYS USING E-BEAM GENERATED CONTACT GRATING MASKS/

Authors
TENNANT DM KOCH TL
Citation
Dm. Tennant et Tl. Koch, FABRICATION AND UNIFORMITY ISSUES IN LAMBDA 4 SHIFTED DFB LASER ARRAYS USING E-BEAM GENERATED CONTACT GRATING MASKS/, Microelectronic engineering, 32(1-4), 1996, pp. 331-350
Citations number
15
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
32
Issue
1-4
Year of publication
1996
Pages
331 - 350
Database
ISI
SICI code
0167-9317(1996)32:1-4<331:FAUIIL>2.0.ZU;2-0
Abstract
We describe the fabrication and performance of lambda/4 shifted DFB la ser arrays made using electron beam-generated near field holographic g rating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength var iations in DFB lasers. Projections are made regarding the epitaxial th ickness, composition, and waveguide etching control required to achiev e a source wavelength absolute reproducibility of +/- 0.1 nm.