A MORPHOLOGICAL STABILITY ANALYSIS OF THE GROWTH INTERFACE DURING LIQUID-PHASE ELECTROEPITAXY

Authors
Citation
S. Dost et J. Su, A MORPHOLOGICAL STABILITY ANALYSIS OF THE GROWTH INTERFACE DURING LIQUID-PHASE ELECTROEPITAXY, Journal of crystal growth, 167(1-2), 1996, pp. 305-319
Citations number
31
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
167
Issue
1-2
Year of publication
1996
Pages
305 - 319
Database
ISI
SICI code
0022-0248(1996)167:1-2<305:AMSAOT>2.0.ZU;2-Y
Abstract
A linear morphological stability analysis for the growth interface dur ing an LPEE growth of a binary system is presented, In the model a two -dimensional growth cell configuration is used. The model is diffusion based and fluid flow in the solution is not taken into account. Elect romigration in the solution is included, but thermoelectric effects su ch as Peltier cooling and Joule heating are not considered. The govern ing equations are linearized about the initial growth interface by sma ll perturbations, and the stability equations are obtained. From these equations, stability criteria are obtained numerically, Results show that the effect of finite dimension of the growth cell on the stabilit y of interface is significant.