S. Dost et J. Su, A MORPHOLOGICAL STABILITY ANALYSIS OF THE GROWTH INTERFACE DURING LIQUID-PHASE ELECTROEPITAXY, Journal of crystal growth, 167(1-2), 1996, pp. 305-319
A linear morphological stability analysis for the growth interface dur
ing an LPEE growth of a binary system is presented, In the model a two
-dimensional growth cell configuration is used. The model is diffusion
based and fluid flow in the solution is not taken into account. Elect
romigration in the solution is included, but thermoelectric effects su
ch as Peltier cooling and Joule heating are not considered. The govern
ing equations are linearized about the initial growth interface by sma
ll perturbations, and the stability equations are obtained. From these
equations, stability criteria are obtained numerically, Results show
that the effect of finite dimension of the growth cell on the stabilit
y of interface is significant.