WAFER LEVEL MEASUREMENT SYSTEM FOR SARF CHARACTERIZATION OF METAL LINES

A feasibility study concerning the application of the SARF technique a t wafer level has been performed. The main problem of this type of mea surements is the excess noise generated at the point contacts used to supply the lines under investigation with the test current. This probl em has been successfully solved by setting up a probe station entirely contained in a shielded box and by supplying the samples under test b y means of purposely designed low noise current sources. The backgroun d noise of the whole measurement system coincides with that of the sys tem used until now for packaged samples. Copyright (C) 1996 Elsevier S cience Ltd