Re. Ricker et al., NANOFABRICATION OF A QUANTUM-DOT ARRAY - ATOMIC-FORCE MICROSCOPY OF ELECTROPOLISHED ALUMINUM, Journal of electronic materials, 25(10), 1996, pp. 1585-1592
One step required for the fabrication of a quantum dot array on an alu
minum substrate is the preparation of a flat aluminum surface. To enab
le the optimization of the electropolishing procedure, atomic force mi
croscopy was used to examine the morphology of electropolished polycry
stalline aluminum surfaces that were prepared under different electrop
olishing conditions. The electropolishing voltage, time, and temperatu
re were varied. Two distinctly different surface morphologies were obs
erved for different electropolishing conditions and transitional struc
tures were observed for intermediate conditions. It was found that the
type of surface morphology and the surface roughness could be control
led primarily with the electropolishing voltage while temperature and
time had relatively little effect over the range examined in this stud
y.