RESIDUAL DISORDER IN LOW-PRESSURE, LOW THERMAL-GRADIENT LIQUID ENCAPSULATED CZOCHRALSKI GALLIUM-ARSENIDE OBSERVED IN HIGH-RESOLUTION SYNCHROTRON DIFFRACTION IMAGING

Citation
B. Steiner et al., RESIDUAL DISORDER IN LOW-PRESSURE, LOW THERMAL-GRADIENT LIQUID ENCAPSULATED CZOCHRALSKI GALLIUM-ARSENIDE OBSERVED IN HIGH-RESOLUTION SYNCHROTRON DIFFRACTION IMAGING, Journal of crystal growth, 169(1), 1996, pp. 1-12
Citations number
17
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
169
Issue
1
Year of publication
1996
Pages
1 - 12
Database
ISI
SICI code
0022-0248(1996)169:1<1:RDILLT>2.0.ZU;2-S
Abstract
High resolution synchrotron X-radiation diffraction images of low ther mal gradient, low pressure, liquid encapsulated Czochralski (LEG) sili con-doped gallium arsenide display a degree of crystalline order that is far higher than that found in undoped conventional LEC material. No distinct Volume irregularity is observed in one crystal where it is u nstrained. Only a set of surface-treatment-related dislocations is pro minent in a second. A third crystal exhibits two distinct sets of quas i periodic dislocations, which have been analyzed in detail. The resul ts support a model previously proposed for the evolution of disorder i n gallium arsenide and suggest the role that silicon plays in its cont rol.