TECHNIQUES FOR MOLECULAR-BEAM EPITAXY OF MULTIPLE-WAVELENGTH VERTICAL-CAVITY LASER ARRAYS

Authors
Citation
K. Sadra, TECHNIQUES FOR MOLECULAR-BEAM EPITAXY OF MULTIPLE-WAVELENGTH VERTICAL-CAVITY LASER ARRAYS, Journal of crystal growth, 169(1), 1996, pp. 175-180
Citations number
12
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
169
Issue
1
Year of publication
1996
Pages
175 - 180
Database
ISI
SICI code
0022-0248(1996)169:1<175:TFMEOM>2.0.ZU;2-T
Abstract
New techniques are proposed for engineering the lateral growth rate pr ofile in molecular beam epitaxy for fabrication of arrays of vertical- cavity lasers operating at different wavelengths. A previous study of the use of flux masks to achieve uniform profiles is extended to the c ase of intentionally nonuniform profiles along the radial direction. I t is further suggested that substrate rotation at variable angular vel ocities can produce intentionally nonuniform profiles in the polar dir ection.