SUPPRESSION OF TWINS IN GAAS-LAYERS GROWN ON A GAP(111)B SUBSTRATE BYLIQUID-PHASE EPITAXY

Citation
H. Udono et al., SUPPRESSION OF TWINS IN GAAS-LAYERS GROWN ON A GAP(111)B SUBSTRATE BYLIQUID-PHASE EPITAXY, Journal of crystal growth, 169(1), 1996, pp. 181-184
Citations number
9
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
169
Issue
1
Year of publication
1996
Pages
181 - 184
Database
ISI
SICI code
0022-0248(1996)169:1<181:SOTIGG>2.0.ZU;2-B
Abstract
Heteroepitaxial growth of GaAs on GaP(111)B was demonstrated by liquid phase epitaxy. In order to suppress the generation of rotational twin s, initial saturation conditions of Ga-As solution contacting with a G aP substrate were investigated at 800 degrees C. Supersaturated and un dersaturated solutions caused a number of twins in the grown GaAs laye r, while saturated solution led only a few percents in volume. It was concluded that near equilibrium contact is effective to reduce the twi ns.