GROWTH OF SIXGE1-X CRYSTALS BY THE MICRO-PULLING-DOWN METHOD

Citation
N. Schafer et al., GROWTH OF SIXGE1-X CRYSTALS BY THE MICRO-PULLING-DOWN METHOD, Journal of crystal growth, 166(1-4), 1996, pp. 675-679
Citations number
15
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
166
Issue
1-4
Year of publication
1996
Pages
675 - 679
Database
ISI
SICI code
0022-0248(1996)166:1-4<675:GOSCBT>2.0.ZU;2-4
Abstract
Si-rich SixGe1-x micro-single-crystals with a diameter in the range of 300 to 900 mu m were grown by the micro-pulling-down method. Growth w ith constant diameter could be achieved without an automatic diameter control system. Due to the design of the crucible, the transport of so lute and, thus, the effective distribution coefficient k(eff) can be r eproducibly controlled by a variation of the crystal diameter or growt h rate. An adjustment to k(eff) = 1 allows the growth of crystals with constant axial composition, whereas crystals of a desired axial compo sition profile can be grown by appropriate variation of the controllin g parameters.