Information concerning the preparation, physicochemical properties, an
d applications of aluminum nitride is summarized. Evidence is presente
d that the properties of AlN materials in technological applications a
re controlled by point defects. Equations describing defect formation
in aluminum nitride by the Schottky, Frenkel, and anti-Frenkel mechani
sms are derived, and solutions relating defect concentration to equili
brium nitrogen partial pressure are obtained, The assumption is made t
hat the dominant nonstoichiometric point defects in aluminum nitride a
re aluminum vacancies.