Detailed analysis of the 1/f low-frequency noise (LFN) in In0.52Al0.48
As/InGaAs MODFET structures is performed, for low drain bias (below pi
nch-off voltage), in order to identify the physical origin and the loc
ation of the noise sources responsible for drain current fluctuations
in the frequency range 0.1 Hz-10(5) Hz, Experimental data were analyze
d with the support of a general modeling of the 1/f LFN induced by tra
ps distributed within the different layers and interfaces which consti
tute the heterostructures, Comparative noise measurements are performe
d on a variety of structures with different barrier (InAlAs, InP) and
different channel (InGaAs lattice matched to InP, strained InGaAs, InP
) materials, It is concluded that the dominant low frequency noise sou
rces of InAlAs/InGaAs MODFET transistors in the ON state are generated
by deep traps distributed within the ''bulk'' InAlAs barrier and buff
er layers, For reverse gate bias, the gate current appears to be the d
ominant contribution to the channel LFN, whereas both the gate current
and the drain and source ohmic contacts are the dominant sources of n
oise when the device is biased strongly in the ON state. Heterojunctio
n FET's on InP substrate with InP barrier and buffer layers show signi
ficantly lower LFN and appear to be more suitable for applications suc
h as nonlinear circuits that have noise upconversion.