SPUTTERING OF METALLIC WALLS IN AR H-2 DIRECT-CURRENT GLOW-DISCHARGESAT ROOM-TEMPERATURE/

Laser induced fluorescence of Cr atoms in their ground state have been used to characterize metallic sputtering in de glow discharges (GDs) of hydrogen/argon admixtures in a stainless steel chamber at room temp erature. A strong decrease in the sputtering signal was observed upon addition of H-2 to the pure Ar GD plasma, at constant pressure and tot al current conditions, even at low H-2 concentrations in the admixture . The plasma microscopic parameters have been determined from actinome try and Langmuir probe data. The H implantation characteristics of the studied plasmas were also determined by pump and release experiments. According to all the experimental evidence, hydrogen implantation in the metal surface is the main process responsible for the observed spu ttering suppression. The results are compared to similar sputtering re duction observations previously reported in other light contaminant/me tal systems. (C) 1996 American Vacuum Society.