INFLUENCE OF SURFACE OXYGEN ON CHEMORESISTANCE OF TIN OXIDE FILM

Citation
S. Kaciulis et al., INFLUENCE OF SURFACE OXYGEN ON CHEMORESISTANCE OF TIN OXIDE FILM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(6), 1996, pp. 3164-3168
Citations number
20
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
14
Issue
6
Year of publication
1996
Pages
3164 - 3168
Database
ISI
SICI code
0734-2101(1996)14:6<3164:IOSOOC>2.0.ZU;2-A
Abstract
The oxygen controlled chemoresistance of tin oxide based gas sensors w as investigated in the temperature range from 20 to 320 degrees C. Pol ycrystalline thin film gas sensors were fabricated by the reactive dc- magnetron sputtering. The parameters of the sensors were also modified by additional Pt or Sb doping. The effect of surface oxygen species o n the chemoresistance was studied by x-ray photoelectron spectroscopic (XPS) analysis of the surface chemical composition before and after d ifferent sample treatments. The oxygen peak at a binding energy 531.8 eV in the XPS core level spectrum was found to be related to the chemi sorbed molecular oxygen O-2(-). The variation of an amount of the O-2( -) species is found to be the main cause of gas sensitivity of tin oxi de films at temperatures from 20 to 230 degrees C. (C) 1996 American V acuum Society.