FLUOROCARBON HIGH-DENSITY PLASMAS .7. INVESTIGATION OF SELECTIVE SIO2-TO-SI3N4 HIGH-DENSITY PLASMA ETCH PROCESSES (VOL 14, PG 2127, 1996)

Authors
ZHANG Y OEHRLEIN GS BELL FH
Citation
Y. Zhang et al., FLUOROCARBON HIGH-DENSITY PLASMAS .7. INVESTIGATION OF SELECTIVE SIO2-TO-SI3N4 HIGH-DENSITY PLASMA ETCH PROCESSES (VOL 14, PG 2127, 1996), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(6), 1996, pp. 3291-3291
Citations number
1
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
14
Issue
6
Year of publication
1996
Pages
3291 - 3291
Database
ISI
SICI code
0734-2101(1996)14:6<3291:FHP.IO>2.0.ZU;2-1