ATOMIC-HYDROGEN RESIST PROCESS WITH ELECTRON-BEAM LITHOGRAPHY FOR SELECTIVE AL PATTERNING

Authors
MASU K TSUBOUCHI K
Citation
K. Masu et K. Tsubouchi, ATOMIC-HYDROGEN RESIST PROCESS WITH ELECTRON-BEAM LITHOGRAPHY FOR SELECTIVE AL PATTERNING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3270-3274
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3270 - 3274
Database
ISI
SICI code
1071-1023(1994)12:6<3270:ARPWEL>2.0.ZU;2-7