HIGH-ASPECT-RATIO DRY-ETCHING FOR MICROCHANNEL PLATES

Authors
SNIDER GL THEN AM SEAVE RJ TASKER GW
Citation
Gl. Snider et al., HIGH-ASPECT-RATIO DRY-ETCHING FOR MICROCHANNEL PLATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3327-3331
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3327 - 3331
Database
ISI
SICI code
1071-1023(1994)12:6<3327:HDFMP>2.0.ZU;2-Z