REACTIVE-ION-BEAM ETCHING OF INP IN A CHLORINE-HYDROGEN MIXTURE

Authors
VAWTER GA ASHBY CIH
Citation
Ga. Vawter et Cih. Ashby, REACTIVE-ION-BEAM ETCHING OF INP IN A CHLORINE-HYDROGEN MIXTURE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3374-3377
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3374 - 3377
Database
ISI
SICI code
1071-1023(1994)12:6<3374:REOIIA>2.0.ZU;2-M