RADICAL BEAM ION-BEAM ETCHING OF INALAS INP USING CL-2/

Authors
YU DG HU EL HASNAIN G
Citation
Dg. Yu et al., RADICAL BEAM ION-BEAM ETCHING OF INALAS INP USING CL-2/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3378-3381
Citations number
5
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3378 - 3381
Database
ISI
SICI code
1071-1023(1994)12:6<3378:RBIEOI>2.0.ZU;2-F