APPLICATION OF A HIGH-THROUGHPUT ELECTRON-BEAM SYSTEM FOR 0.3 MU-M LARGE-SCALE INTEGRATION

Authors
MIZUNO F KATO M HAYAKAWA H SATO K HASEGAWA K SAKITANI Y SAITOU N MURAI F SHIRAISHI H UCHINO SI
Citation
F. Mizuno et al., APPLICATION OF A HIGH-THROUGHPUT ELECTRON-BEAM SYSTEM FOR 0.3 MU-M LARGE-SCALE INTEGRATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3440-3443
Citations number
4
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3440 - 3443
Database
ISI
SICI code
1071-1023(1994)12:6<3440:AOAHES>2.0.ZU;2-P