PATTERN DISTORTIONS IN STENCIL MASKS

Authors
RANDALL JN
Citation
Jn. Randall, PATTERN DISTORTIONS IN STENCIL MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3543-3546
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3543 - 3546
Database
ISI
SICI code
1071-1023(1994)12:6<3543:PDISM>2.0.ZU;2-9