AN INDUSTRIAL PLASMA PROCESS FOR AVOIDING CHARGE EFFECT

Authors
ROMAND P WEILL A PANABIERE JP PROLA A
Citation
P. Romand et al., AN INDUSTRIAL PLASMA PROCESS FOR AVOIDING CHARGE EFFECT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3550-3554
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3550 - 3554
Database
ISI
SICI code
1071-1023(1994)12:6<3550:AIPPFA>2.0.ZU;2-G