EXTENDING THE LIMITS OF OPTICAL LITHOGRAPHY FOR ARBITRARY MASK LAYOUTS USING ATTENUATED PHASE-SHIFTING MASKS WITH OPTIMIZED ILLUMINATION

Authors
RONSE K PFORR R BAIK KH JONCKHEERE R VANDENHOVE L
Citation
K. Ronse et al., EXTENDING THE LIMITS OF OPTICAL LITHOGRAPHY FOR ARBITRARY MASK LAYOUTS USING ATTENUATED PHASE-SHIFTING MASKS WITH OPTIMIZED ILLUMINATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3783-3792
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3783 - 3792
Database
ISI
SICI code
1071-1023(1994)12:6<3783:ETLOOL>2.0.ZU;2-4