CHARACTERIZATION OF A 193 NM OPTICAL LITHOGRAPHY SYSTEM FOR 0.18 MU-MAND BELOW

Citation
A. Grenville et al., CHARACTERIZATION OF A 193 NM OPTICAL LITHOGRAPHY SYSTEM FOR 0.18 MU-MAND BELOW, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3814-3819
Citations number
10
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3814 - 3819
Database
ISI
SICI code
1071-1023(1994)12:6<3814:COA1NO>2.0.ZU;2-1