CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY

KUBIAK GD TICHENOR DA RAYCHAUDHURI AK MALINOWSKI ME STULEN RH HANEY SJ BERGER KW NISSEN RP WILKERSON GA PAUL PH BJORKHOLM JE FETTER LA FREEMAN RR HIMEL MD MACDOWELL AA TENNANT DM WOOD OR WASKIEWICZ WK WHITE DL WINDT DL JEWELL TE

Gd. Kubiak et al., CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3820-3825

19

Physics, Applied

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP

10711023

12

6

1994

3820 - 3825

ISI

1071-1023(1994)12:6<3820:COAESO>2.0.ZU;2-W