IMAGING OF EXTREME-ULTRAVIOLET LITHOGRAPHIC MASKS WITH PROGRAMMED SUBSTRATE DEFECTS

Authors
NGUYEN KB MIZOTA T HAGA T KINOSHITA H ATTWOOD DT
Citation
Kb. Nguyen et al., IMAGING OF EXTREME-ULTRAVIOLET LITHOGRAPHIC MASKS WITH PROGRAMMED SUBSTRATE DEFECTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3833-3840
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3833 - 3840
Database
ISI
SICI code
1071-1023(1994)12:6<3833:IOELMW>2.0.ZU;2-E