THERMAL AND ACID-CATALYZED DEPROTECTION KINETICS IN CANDIDATE DEEP-ULTRAVIOLET RESIST MATERIALS

Authors
WALLRAFF G HUTCHINSON J HINSBERG W HOULE F SEIDEL P JOHNSON R OLDHAM W
Citation
G. Wallraff et al., THERMAL AND ACID-CATALYZED DEPROTECTION KINETICS IN CANDIDATE DEEP-ULTRAVIOLET RESIST MATERIALS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3857-3862
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3857 - 3862
Database
ISI
SICI code
1071-1023(1994)12:6<3857:TAADKI>2.0.ZU;2-X