EFFECT OF ACID DIFFUSION ON PERFORMANCE IN POSITIVE DEEP-ULTRAVIOLET RESISTS

Authors
FEDYNYSHYN TH THACKERAY JW GEORGER JH DENISON MD
Citation
Th. Fedynyshyn et al., EFFECT OF ACID DIFFUSION ON PERFORMANCE IN POSITIVE DEEP-ULTRAVIOLET RESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3888-3894
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3888 - 3894
Database
ISI
SICI code
1071-1023(1994)12:6<3888:EOADOP>2.0.ZU;2-8