MODELING AND SIMULATIONS OF A POSITIVE CHEMICALLY AMPLIFIED PHOTORESIST FOR X-RAY-LITHOGRAPHY

Authors
KRASNOPEROVA AA KHAN M RHYNER S TAYLOR JW ZHU Y CERRINA F
Citation
Aa. Krasnoperova et al., MODELING AND SIMULATIONS OF A POSITIVE CHEMICALLY AMPLIFIED PHOTORESIST FOR X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3900-3904
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3900 - 3904
Database
ISI
SICI code
1071-1023(1994)12:6<3900:MASOAP>2.0.ZU;2-#