HIGH-SPEED POSITIVE X-RAY RESIST SUITABLE FOR PRECISE REPLICATION OF SUB-0.25-MU-M FEATURES

Authors
BAN H NAKAMURA J DEGUCHI K TANAKA A
Citation
H. Ban et al., HIGH-SPEED POSITIVE X-RAY RESIST SUITABLE FOR PRECISE REPLICATION OF SUB-0.25-MU-M FEATURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3905-3908
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3905 - 3908
Database
ISI
SICI code
1071-1023(1994)12:6<3905:HPXRSF>2.0.ZU;2-Q