PLASMA-POLYMERIZED ALL-DRY RESIST PROCESS FOR 0.25 MU-M PHOTOLITHOGRAPHY

Authors
JOUBERT O WEIDMAN T JOSHI A CIRELLI R STEIN S LEE JTC VAIDYA S
Citation
O. Joubert et al., PLASMA-POLYMERIZED ALL-DRY RESIST PROCESS FOR 0.25 MU-M PHOTOLITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3909-3913
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3909 - 3913
Database
ISI
SICI code
1071-1023(1994)12:6<3909:PARPF0>2.0.ZU;2-I