COMPARATIVE-EVALUATION OF CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM TOP SURFACE IMAGING USE

Authors
IRMSCHER M HOFFLINGER B SPRINGER R
Citation
M. Irmscher et al., COMPARATIVE-EVALUATION OF CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM TOP SURFACE IMAGING USE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3925-3929
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3925 - 3929
Database
ISI
SICI code
1071-1023(1994)12:6<3925:COCARF>2.0.ZU;2-R