WAVELENGTH DEPENDENCE OF EXPOSURE WINDOW AND RESIST PROFILE IN X-RAY-LITHOGRAPHY

Authors
GUO JZY CELLER GK MALDONADO JR HECTOR SD
Citation
Jzy. Guo et al., WAVELENGTH DEPENDENCE OF EXPOSURE WINDOW AND RESIST PROFILE IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 4044-4050
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
4044 - 4050
Database
ISI
SICI code
1071-1023(1994)12:6<4044:WDOEWA>2.0.ZU;2-R