CHARACTERIZATION OF THIN COPPER-FILMS GROWN VIA CHEMICAL-VAPOR-DEPOSITION USING LIQUID COINJECTION OF TRIMETHYLVINYLSILANE AND (HEXAFLUOROACETYLACETONATE) CU (TRIMETHYLVINYLSILANE)

Authors
PARMETER JE PETERSEN GA SMITH PM APBLETT CA REID JS NORMAN JAT HOCHBERG AK ROBERTS DA OMSTEAD TR
Citation
Je. Parmeter et al., CHARACTERIZATION OF THIN COPPER-FILMS GROWN VIA CHEMICAL-VAPOR-DEPOSITION USING LIQUID COINJECTION OF TRIMETHYLVINYLSILANE AND (HEXAFLUOROACETYLACETONATE) CU (TRIMETHYLVINYLSILANE), Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(1), 1995, pp. 130-136
Citations number
48
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
1
Year of publication
1995
Pages
130 - 136
Database
ISI
SICI code
1071-1023(1995)13:1<130:COTCGV>2.0.ZU;2-B