FABRICATION OF SUB-100 NM GAAS COLUMNS BY REACTIVE ION ETCHING USING AU ISLANDS AS ETCHING MASK

Authors
AHOPELTO J AIRAKSINEN VM SIREN E NIEMI HEM
Citation
J. Ahopelto et al., FABRICATION OF SUB-100 NM GAAS COLUMNS BY REACTIVE ION ETCHING USING AU ISLANDS AS ETCHING MASK, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(1), 1995, pp. 161-162
Citations number
6
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
1
Year of publication
1995
Pages
161 - 162
Database
ISI
SICI code
1071-1023(1995)13:1<161:FOSNGC>2.0.ZU;2-N