EFFECTS OF OBLIQUE ENERGETIC BOMBARDMENT ON THE MORPHOLOGY AND MICROSTRUCTURE OF TRIODE ION-PLATED TITANIUM FILMS

The effect of angle of incidence of ions, varied between 45 degrees an d 90 degrees, generated in a triode ion plating system on the morpholo gy and microstructure of titanium films, has been investigated. It has been found that intensity of reflections, lattice parameters, stress, and grain size are strong functions of the angle of incidence of the ions. The same properties were studied for their variation with bias v oltage between 0 and 2 kV at a constant substrate bias current of 10 m A. It was found that the intensity of the (002) reflection increases w ith an increase in angle of ion incidence up to 60 degrees. The lattic e parameter and stress reach a minimum while the grain size goes throu gh a maximum at this value. All the films show a tensile stress indepe ndent of deposition parameters. To isolate the effects due to ion bomb ardment the films have been coated in high vacuum, in a diode mode, an d finally the triode configuration. It has been conclusively found tha t the angle of incidence of ions is very important in controlling prop erties and growth of the films. (C) 1996 American Vacuum Society.