MEASUREMENTS OF PULSED-POWER MODULATED ARGON PLASMAS IN AN INDUCTIVELY-COUPLED PLASMA SOURCE

Citation
S. Ashida et al., MEASUREMENTS OF PULSED-POWER MODULATED ARGON PLASMAS IN AN INDUCTIVELY-COUPLED PLASMA SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 391-397
Citations number
18
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
14
Issue
2
Year of publication
1996
Pages
391 - 397
Database
ISI
SICI code
0734-2101(1996)14:2<391:MOPMAP>2.0.ZU;2-Q
Abstract
The behavior of pulsed-power (square wave) modulated argon plasmas gen erated by an inductively coupled plasma (ICP) source is experimentally investigated. The apparatus is an ICP source with a flat coil geometr y equipped with a cylindrical Langmuir probe on the axis of the cylind rical chamber. The evolution of the plasma density is determined from the wave forms of ion saturation currents. The rise and fall of the de nsity had a time scale of a few tens of microseconds. The time average plasma density is also measured as a function of pulse frequency and duty ratio, holding the average absorbed power constant. When the plas ma is modulated, the density is larger than that for a continuous wave excitation of the same average power. Larger densities are obtained f or smaller duty ratios. The density increases monotonically as the per iod is decreased down to 100 mu s. This agrees qualitatively with the modeling result, which accounts for the higher density by the differen ce of time scales for the generation and the loss of charged particles . The results for electron temperature measurements also show good agr eement with the model quantitatively during the pulse ''on'' times. If the period is long enough, it is found that the electron temperature rises abruptly at the initial stage of power application, in agreement with the calculation. (C) 1996 American Vacuum Society.