S. Ashida et al., MEASUREMENTS OF PULSED-POWER MODULATED ARGON PLASMAS IN AN INDUCTIVELY-COUPLED PLASMA SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 391-397
Citations number
18
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
The behavior of pulsed-power (square wave) modulated argon plasmas gen
erated by an inductively coupled plasma (ICP) source is experimentally
investigated. The apparatus is an ICP source with a flat coil geometr
y equipped with a cylindrical Langmuir probe on the axis of the cylind
rical chamber. The evolution of the plasma density is determined from
the wave forms of ion saturation currents. The rise and fall of the de
nsity had a time scale of a few tens of microseconds. The time average
plasma density is also measured as a function of pulse frequency and
duty ratio, holding the average absorbed power constant. When the plas
ma is modulated, the density is larger than that for a continuous wave
excitation of the same average power. Larger densities are obtained f
or smaller duty ratios. The density increases monotonically as the per
iod is decreased down to 100 mu s. This agrees qualitatively with the
modeling result, which accounts for the higher density by the differen
ce of time scales for the generation and the loss of charged particles
. The results for electron temperature measurements also show good agr
eement with the model quantitatively during the pulse ''on'' times. If
the period is long enough, it is found that the electron temperature
rises abruptly at the initial stage of power application, in agreement
with the calculation. (C) 1996 American Vacuum Society.