Gmw. Kroesen et al., IN-SITU INFRARED-ABSORPTION SPECTROSCOPY OF DUSTY PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 546-549
Citations number
2
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
II? situ, time-resolved Fourier transform infrared spectroscopy was us
ed to study particulate formation in rf discharges in mixtures of sila
ne, argon, and nitrogen. The spectra were taken at a maximum rate of 2
0 Hz. The discharge conditions were chosen such that previous calibrat
ions of the time evolutions of particle size and density could be used
. The measurements indicate that the onset of the solid-state vibratio
nal absorptions of the SIH and SiH2 bands only takes place after the n
ucleation and coagulation phase have finished; it coincides with the p
reviously predicted start of the deposition of amorphous hydrogenated
silicon on the particles. The dissociation of the silane feed gas is f
ound to be in the range of 30%, and its time development suggests that
also the large-scale dissociation of silane only starts after the coa
gulation phase. This is in agreement with previously observed trends f
or the electron temperature. If silicon partilces are grown in the pla
sma, and the silane flow is stopped, the Si particles stay trapped in
the glow. The infrared measurements, however, show that they almost co
mpletely oxidize: the SiH/SiH2 vibrations disappear and a strong SiO v
ibration appears. If nitrogen gas is allowed into the plasma, the SiO
vibration is replaced by a SiN vibration. (C) 1996 American Vacuum Soc
iety.