A model for the simulation of the programming operations of a FLOTOX E
EPROM cell is proposed. The model takes into account the following phe
nomena occurring during the erase operation: (I)depletion layers in th
e tunnel (thin) oxide area, the channel area, the poly-drain overlap a
rea and the source diffusion area; (2) band to band tunnelling in the
tunnel area; (3) impact ionization of the tunnelling electrons; and (4
) channel depletion. Results for the write operation are also presente
d as a comparison. The computer model serves as a tool for theoretical
understanding of the programming operation of the FLOTOX EEPROM, and
a model for future CAD tools. Results of the simulation show the appea
rance of an anomalous tunnel current peak that compares well with the
experimental results presented by other authors.