Mk. Mazumder et al., STRESS-INDUCED CURRENT IN NITRIDE AND OXIDIZED NITRIDE THIN-FILMS, I.E.E.E. transactions on electron devices, 41(12), 1994, pp. 2417-2422
We have studied the stress-induced current in nitride and oxidized nit
ride films using MOS capacitors and p-channel MOSFET transistors, When
the gate current is measured as a function of electric field in MOS c
apacitors, gate current on oxidized nitride film is considerably lower
than in nitride film. After subjecting both films to a constant curre
nt stress, however, measured gate current in oxidized nitride him beco
mes much greater than in nitride film, Using PMOSFET transistor, it is
observed that holes dominate the current conduction both for nitride
and oxidized nitride films. When the films are subjected to a constant
current stress, both the hole and electron currents increased compare
d to those before stress. After the constant current stress, the elect
ron curl ent is increased more in the nitride film, while in oxidized
nitride film, hole current increase is dominant. Hence it can be said
that the current increase in nitride films is due to the stress-genera
ted trap of electrons, while in:oxidized nitride film, it is due to st
ress-generated hole traps in the top oxide.