MICROTEXTURE DETERMINATION IN FE-SI ALLOY SHEETS BY ETCH FITTING - COMPARISON WITH THE ELECTRON BACKSCATTERING PATTERN TECHNIQUE

The EBSP (electron back-scattering pattern) technique is used to verif y individual crystallographic orientations measured by the etch-pit me thod in an Fe-Si sheet. These orientations are directly determined fro m geometrical parameters characterizing the etch pits. 92 orientations determined with these two methods are compared and it appears difficu lt to obtain very good accuracy on the determination of crystallograph ic orientations with the etch-pit method. However, although this error obviously remains during a statistical analysis of texture or of grai n boundaries, the etch-pit method remains very interesting for qualita tive or semi-quantitative studies.